ʻIkepili Photoresist
ʻO ka Photoresist, i ʻike ʻia hoʻi he photoresist, e pili ana i kahi mea ʻili lahilahi nona ka solubility e loli ke hoʻoheheʻe ʻia i ka wā e hōʻike ʻia ai i ka mālamalama UV, nā kukuna electron, nā kukuna ion, nā kukuna X, a i ʻole nā kukui ʻē aʻe.
Ua haku ʻia ia me kahi resin, kahi photoinitiator, kahi solvent, kahi monomer, a me nā mea hoʻohui ʻē aʻe (e nānā i ka Papa 1). ʻO ka resin Photoresist a me ka photoinitiator nā ʻāpana koʻikoʻi e pili ana i ka hana photoresist. Hoʻohana ʻia ia ma ke ʻano he uhi anti-corrosion i ka wā o ke kaʻina hana photolithography.
I ka hana ʻana i nā ʻili semiconductor, me ka hoʻohana ʻana i kahi photoresist koho kūpono hiki ke hana i ke kiʻi i makemake ʻia ma luna o ka ʻili.
Papa 1.
| Nā Mea Hoʻohui Photoresist | Hana |
| Mea hoʻoheheʻe | Hoʻolilo ia i ka photoresist i wai a me ka hū, a ʻaneʻane ʻaʻohe hopena i nā waiwai kemika o ka photoresist. |
| Mea hoʻomaka kiʻi | Ua kapa ʻia hoʻi ʻo ia he photosensitizer a i ʻole photocuring agent, ʻo ia ka ʻāpana photosensitive i loko o ka mea photoresist. He ʻano hui ia e hiki ke hoʻokahe i loko o nā radical free a i ʻole cations a hoʻomaka i nā hopena kemika cross-linking i loko o nā monomers ma hope o ka omo ʻana i ka ikehu ultraviolet a i ʻole ka ikehu kukui ʻike ʻia o kahi nalu. |
| ʻO ka Resin | He mau polymers inert ia, a hana ma ke ʻano he mea hoʻopaʻa e hoʻopaʻa i nā mea like ʻole i loko o kahi photoresist, e hāʻawi ana i ka photoresist i kona mau waiwai mechanical a me kemika. |
| Monomer | Ua ʻike ʻia hoʻi ia he mau diluents hana, he mau mole liʻiliʻi e loaʻa ana nā hui hana polymerizable a he mau hui kaumaha molekala haʻahaʻa e hiki ke komo i nā hopena polymerization e hana i nā resins kaumaha molekala kiʻekiʻe. |
| Mea hoʻohui | Hoʻohana ʻia ia e kāohi i nā ʻano kemika kikoʻī o nā photoresists. |
Ua hoʻokaʻawale ʻia nā Photoresist i ʻelua mau māhele nui e pili ana i ke kiʻi a lākou e hana ai: maikaʻi a maikaʻi ʻole. I ka wā o ke kaʻina hana photoresist, ma hope o ka hōʻike ʻana a me ka hoʻomohala ʻana, ua hoʻoheheʻe ʻia nā ʻāpana i hōʻike ʻia o ka uhi, e waiho ana i nā ʻāpana i hōʻike ʻole ʻia. Ua manaʻo ʻia kēia uhi he photoresist maikaʻi. Inā noho nā ʻāpana i hōʻike ʻia ʻoiai ua hoʻoheheʻe ʻia nā ʻāpana i hōʻike ʻole ʻia, ua manaʻo ʻia ka uhi he photoresist maikaʻi ʻole. Ma muli o ke kumu mālamalama a me ke kumu radiation, ua hoʻokaʻawale hou ʻia nā photoresist e like me UV (me nā photoresist UV maikaʻi a maikaʻi ʻole), nā photoresist UV hohonu (DUV), nā photoresist X-ray, nā photoresist kukuna uila, a me nā photoresist kukuna ion.
Hoʻohana nui ʻia ka Photoresist i ka hana ʻana o nā ʻano kikoʻī maikaʻi i nā panela hōʻike, nā kaapuni i hoʻohui ʻia, a me nā mea semiconductor discrete. He paʻakikī ka ʻenehana hana ma hope o ka photoresist, me nā ʻano huahana like ʻole a me nā kikoʻī. Hoʻokau ka hana kaapuni i hoʻohui ʻia o ka ʻoihana uila i nā koi koʻikoʻi ma ka photoresist i hoʻohana ʻia.
ʻO Ever Ray, kahi mea hana me 20 mau makahiki o ka ʻike loea i ka hana ʻana a me ka hoʻomohala ʻana i nā resins photocurable, e kaena ana i kahi hiki ke hana i kēlā me kēia makahiki he 20,000 tons, kahi laina huahana piha, a me ka hiki ke hoʻopilikino i nā huahana. I ka photoresist, loaʻa iā Ever Ray ka resin 17501 ma ke ʻano he ʻāpana nui.
